An exceptional Nigerian-American man named Ololade Abdulahi Akinsanya has bagged two degrees in Chemical Engineering and Business Management from the Massachusetts Institute of Technology (MIT) in the United States of America.
He also emerged as the best-graduating student in the school with a cumulative grade point average of 4.20 GPA.
Ololade shared a post on his Instagram with a series of his graduation pictures to celebrate his success. “Brains, brilliance, and bow ties,” he wrote.
Ololade was admitted into MIT on a full scholarship after he graduated from High School in 2019 as the best student with a 4.77 GPA.
“Whew! I did that. “I may not have gone where I intended to go, but I think I have ended up where I intended to be.” Thank you to everyone who has supported me, encouraged me, and motivated me to make it this far. Every experience I’ve had, good and bad, has contributed to my development as a successful student and individual,” he said in a celebratory post in 2019.
‘’It’s been an amazing journey, and I’m proud to say that I graduated from my high school, Elite Scholars Academy, as valedictorian with a 4.77 GPA and a full-ride scholarship to MIT. Moving on is bittersweet, but I’m excited to explore the next chapter of my life. Expect great things’’, he added.
Ololade is the son of MC Oluomo, a popular Nigerian Chief. In 2023, after the graduation of Ololade from MIT, Oluomo took to his Instagram page to congratulate his son. He praised him for graduating from one of the highly-ranked universities globally with a double major and for maintaining a 4.20 GPA.
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“Today, I celebrate my son, Ololade Abdulai Akinsanya. He has graduated from MIT, one of the highest-ranked universities globally, with a double major in Chemical Engineering and Business Management, maintaining a remarkable 4.0 GPA,” he wrote.
He further expressed that his son did not just graduate from the university but his exceptional abilities and commitment to studying were recognized by both the Department of Chemical Engineering and Business Management.